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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
, J. Phys. D: Appl. Phys.
54
, (36), 365103: 1-12 (2021)
M.V. Verweg, B. Lochocki, J.F. de Boer and L.V. Amitonova:
Speckle-Based Super-Resolution Imaging via a Multimode Fiber
In:
Optics InfoBase Conference Papers, Part of European Conferences on Biomedical Optics, ECBO 2021, paper ES1A.4, OSA Technical Digest (Optical Society of America), 2021.
B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova:
Resolution limits of compressive imaging via a multimode fiber
In:
European Conferences on Biomedical Optics 2021 (ECBO), ESIA.5, OSA Technical Digest (Optical Society of America), 2021.
J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High-Order Harmonic Generation in Laser Produced Plasmas
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse:
Towards Multimode-fiber-based Two-photon Endoscopy
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef:
Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy
In:
Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.
E. Sauzeau,
Characterization of topography across the scales
, Université de Limoges, 2021-06-14
M. Du,
Computational Depth-resolved Imaging and Metrology
, VU University Amsterdam, 2021-06-09
O.C.M. Lugier,
Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography
, University of Amsterdam, 2021-06-03
K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge,
Structural effects of meso-halogenation on porphyrins
, Beilstein J. Org. Chem
17
, 1149-1170 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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ARCNL Newsletter