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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • F.-C. Hsia, C.-C. Hsu, L. Peng, F.M. Elam, C. Xiao, S.E. Franklin, D. Bonn and B. Weber, Contribution of Capillary Adhesion to Friction at Macroscopic Solid–Solid Interfaces, Phys. Rev. Appl. 17, (3), 034034: 1-11 (2022)

  • J. Hernandez-Rueda, B. Liu, D.J. Hemminga, Y. Mostafa, R.A. Meijer, D. Kurilovich, M.M. Basko, H. Gelderblom, J. Sheil and O.O. Versolato, Early-time hydrodynamic response of a tin droplet driven by laser-produced plasma, Phys. Rev. Res. 4, (1), 013142: 1-14 (2022)

  • T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor, J. Micro/Nanopattern. Mater. Metrol. 21, (1), 014001: 1-10 (2022)

  • N. Thakur, M. Vockenhuber, Y. Ekinci, B. Watts, A. Giglia, N. Mahne, S. Nannarone, S. Castellanos Ortega and A.M. Brouwer, Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance, ACS Mater. Au 2, (3), 343-355 (2022)

  • L. Poirier, A. Bayerle, A.C. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra, Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma, Appl. Phys. B- Lasers O 128, (3), 39: 1-11 (2022)

  • G. de Haan, E. Abram, T.J. van den Hooven and P.C.M. Planken, Plasmonic enhancement of photoacoustic strain-waves on gold gratings, AIP Advances 12, (2), 025227: 1-8 (2022)

  • G. de Haan, Enhanced Generation and Detection of Ultrafast Laser-Induced Acoustic Signals, University of Amsterdam, 2022-01-28

  • L. Loetgering, S. Witte and J. Rothhardt, Advances in laboratory-scale ptychography using high harmonic sources [Invited], Opt. Express 30, (3), 4133-4164 (2022)

  • C.D. Dieleman, J.S. van den Burgt, N. Thakur, E.C. Garnett and B. Ehrler, Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography, ACS Appl. Energy Mater. 5, (2), 1672-1680 (2022)

  • van Eden, D. Verheijde and J. Verhoeven, Secondary electron emission yield measurements of dielectrics based on a novel collector-only method, Nucl. Instrum. Methods. Phys. Res., Sect B 511, 6-11 (2022)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter