Publications - ARCNL

P.M. Kraus and H.J. Wörner, Perspectives of Attosecond Spectroscopy for the Understanding of Fundamental Electron Correlations, Angew. Chem. Int. Ed. 57, 19: 5228-5247 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, T. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Sn ion energy distributions of ns- and ps-laser produced plasmas, Plasma Sources Sci. Technol. 27, 045001:1-8 (2018)
S. Castellanos, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung: Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists In: Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography held 25 February - 1 March 2018 San Jose, California, United States, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte, Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources, Opt. Express 26, 6: 6860-6871 (2018)
B. Weber, T. Suhina, T. Junge, L. Pastewka, A.M. Brouwer and D. Bonn, Molecular probes reveal deviations from Amontons' law in multi-asperity frictional contacts, Nature Commun. 9, 888:1-7 (2018)
F. Torretti, R. Schupp, D. Kurilovich, A. Bayerle, J. Scheers, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Short-wavelength out-of-band EUV emission from Sn laser-produced plasma, J. Phys. B: At. Mol. Opt. Phys. 51, 045005:1-9 (2018)
D. Kurilovich, M.M. Basko, D.A. Kim, F. Torretti, J.C. Visschers, R. Schupp, J. Scheers, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato, Power-law scaling of plasma pressure on laser-ablated tin microdroplets, Phys. Plasmas 25, 012709: 1-10 (2018)
R.V. Mom, J. Vermeer, J.W.M. Frenken and I.M.N. Groot, Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2, J.Phys.Chem.B 122, 2: 788-793 (2018)
M.F. Jager, C. Ott, C.J. Kaplan, P.M. Kraus, D.M. Neumark and S.R. Leone, Attosecond transient absorption instrumentation for thin film materials: Phase transitions, heat dissipation, signal stabilization, timing correction, and rapid sample rotation, Rev. Sci. Instrum. 89, 1 (2018)
A. Thete, D. Geelen, S.J. van der Molen and R.M. Tromp, Charge catastrophe and dielectric breakdown during exposure of organic thin films to low-energy electron radiation, Phys.Rev.Lett. 119, 26: 266803: 1-6 (2017)

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