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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • Articles
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  • J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148

  • L. Cruciani, S. van Vliet, A. Troglia, R. Bliem, N.J. van Druten and P.C.M. Planken, Femtosecond laser induced emission of coherent terahertz pulses from ruthenium thin films, , (2023)

  • C. Leriche, C. Xiao, S.E. Franklin and B. Weber, From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si, Wear 528-529, 204975: 1-8 (2023)

  • J. Lopez Leyva, Light Induced Damage of Silicon Nitride with femtosecond laser, Eindhoven University of Technology, 2023-09-01

  • M. Adhikary, T.C. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6

  • Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar, Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, Opt. Lett. 48, (16), 4316-4318 (2023)

  • L. Poirier, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)

  • M. Bijker, RALEF-2D for Modeling Laser-Produced Plasma: Investigating Anisotropy in Plasma Expansion for Varying Laser Intensities, Vrije Universiteit Amsterdam, VU, 2023-07-17

  • M. Marshall, Phase Retrieval Using Complex Speckle Illumination Patterns and Multiplexing, University of Amsterdam, UvA, 2023-07-14

  • L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D.J. Engels, W.M.G. Ubachs and O.O. Versolato, High-energy parametric oscillator and amplifier pulsed light source at 2-μm, Opt. Express 31, (15), 24142-24156 (2023)

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter