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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
ad interim
Contact Dynamics
Bart Weber
Steve Franklin
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega,
The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
, ACS Appl. Mater. Interfaces
12
, (8), 9881-0889 (2020)
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin,
Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding
, Tribol.Int.
142
, 105983: 1-8 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Spectral characterization of an industrial EUV light source for nanolithography
, J. Phys. D: Appl. Phys.
53
, (5), 055204: 1-7 (2020)
L.V. Amitonova and J.F. de Boer,
Sensitivity analysis of Raman endoscopy with and without wavefront shaping
, Opt. Express
28
, (3), 3779-3788 (2020)
D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz,
Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3
, JACS
142
, (7), 3548-3563 (2020)
G.S. Jansen,
Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology
, VU University Amsterdam, 2020-01-10
H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte,
Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound
, Phys. Rev. Appl.
13
, (1), 014010: 1-14 (2020)
Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson,
Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst
, Nanoscale
12
, (10), 5866-5875 (2020)
J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte:
Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse:
Imaging Applications of Time-Domain Wavefront Shaping
In:
Frontiers in Optics / Laser Science, paper FW5F.3, OSA Technical Digest (Optical Society of America), 2020.
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
ad interim
Contact Dynamics
Bart Weber
Steve Franklin
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter