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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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S.D.C. Roscam Abbing, R. Kolkowski, Z.-Y. Zhang, F. Campi, L. Loetgering, A.F. Koenderink and P.M. Kraus,
Extreme-ultraviolet shaping and imaging by high-harmonic generation from nanostructured silica
, Phys. Rev. Lett.
128
, (22), 223902: 1-7 (2022)
T.J. van den Hooven, G. de Haan and P.C.M. Planken:
Enhancement of acoustic-wave induced reflection changes through surface plasmon polaritons
In:
Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305, SPIE-Intl Soc Optical Eng, 2022.
E. Olsson, J. Yu, H. Zhang, H.-M. Cheng and Q. Cai,
Atomic‐Scale Design of Anode Materials for Alkali Metal (Li/Na/K)‐Ion Batteries: Progress and Perspectives
, Adv. Energy Mater., 2200662: 1-29 (2022)
Z. Lyu, G. Osnabrugge, P.W.H. Pinkse and L.V. Amitonova,
Focus quality in raster-scan imaging via a multimode fiber
, Appl. Opt.
61
, (15), 4363-4369 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
, J. Opt.
24
, (5), 054014: 1-13 (2022)
X. Yao, E. Olsson, M. Wang, J.A. Wang, Q. Cai, N.H. Peng, R. Webb and Y. Zhao,
Xenon Ion Implantation Induced Surface Compressive Stress for Preventing Dendrite Penetration in Solid‐State Electrolytes
, Small, 2108124: 1-9 (2022)
A. Troglia, S. van Vliet, G. Yetik, I.El. Wakil, J. Momand, B.J. Kooi and R. Bliem,
Free-standing nanolayers based on Ru silicide formation on Si(100)
, Phys. Rev. Mater.
6
, (4), 043402: 1-8 (2022)
A.C.C. de Beurs, L. Loetgering, M. Herczog, M. Du, K.S.E. Eikema and S. Witte,
aPIE: an angle calibration algorithm for reflection ptychography
, Opt. Lett.
47
, (8), 1949-1952 (2022)
M. Meier, J. Hulva, Z. Jakub, F. Kraushofer, M. Bobić, R. Bliem, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson,
CO oxidation by Pt-2/Fe3O4: Metastable dimer and support configurations facilitate lattice oxygen extraction
, Sci. Adv.
8
, (13), eabn4580: 1-8 (2022)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
People
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Events
Repository
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ARCNL Newsletter