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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk,
Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation
, OSA Continuum
4
, (1), 121-121 (2021)
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse,
Spatiotemporal focusing through a multimode fiber via time-domain wavefront shaping
, Opt. Express
29
, (1), 272-290 (2021)
S.D.C. Roscam Abbing, Z.-Y. Zhang, R. Kolkowski, F. Campi, A.F. Koenderink and P.M. Kraus:
Coherent diffractive extreme-ultraviolet generation from nanostructured silica
In:
Conference on Lasers and Electro-Optics, CLEO 2021, OPG, 2021.
H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin,
Shape‐Preserving Chemical Conversion of Architected Nanocomposites
, Adv. Mater.
32
, (52), 2003999: 1-7 (2020)
R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink,
Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns
, Opt. Express
28
, (25), 37844-37859 (2020)
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, (25), 37419-37435 (2020)
J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel:
Few-cycle OPCPA at 2 µm with up to 100 W average power
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.
L. Wu,
Metal oxo clusters: molecular design for extreme ultraviolet lithography
, University of Amsterdam, 2020-11-18
A. Schulte, J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High Harmonic Generation in Laser-Produced Plasma
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, OSA Technical Digest (Optical Society of America), 2020.
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter