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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte:
aPIE: Angle calibration algorithm for reflection ptychography
In:
OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.
A. Pelekanidis, L. Loetgering and S. Witte:
Ptychography-based characterization of wavelength-tunable vortex beams
In:
Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.
F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus:
Efficient extreme-ultraviolet multi-band high-order wave mixing in silica
In:
Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE-Intl Soc Optical Eng, 2021. - pp. 117-124
C.D. Dieleman,
Patterning Colloidal Nanocrystals with Light and Electrons
, University of Amsterdam, 2021-06-30
C. Sfiligoj,
Towards stable nanolayers for EUV optics
, University of Amsterdam, 2021-06-30
R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
, J. Phys. D: Appl. Phys.
54
, (36), 365103: 1-12 (2021)
M.V. Verweg, B. Lochocki, J.F. de Boer and L.V. Amitonova:
Speckle-Based Super-Resolution Imaging via a Multimode Fiber
In:
Optics InfoBase Conference Papers, Part of European Conferences on Biomedical Optics, ECBO 2021, paper ES1A.4, OSA Technical Digest (Optical Society of America), 2021.
B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova:
Resolution limits of compressive imaging via a multimode fiber
In:
European Conferences on Biomedical Optics 2021 (ECBO), ESIA.5, OSA Technical Digest (Optical Society of America), 2021.
J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High-Order Harmonic Generation in Laser Produced Plasmas
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter