Publications - ARCNL

F.-C. Hsia, S.E. Franklin, P. Audebert, A.M. Brouwer, D. Bonn and B. Weber, Rougher is more slippery: How adhesive friction decreases with increasing surface roughness due to the suppression of capillary adhesion, Phys. Rev. Res. 3, (4), 043204: 1-9 (2021)
Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato, The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range, AIP Advances 11, (12), 125003: 1-9 (2021)
S.D.C. Roscam Abbing, F. Campi, A. Zeltsi, P. Smorenburg and P.M. Kraus, Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation, Sci. Rep 11, (1), 24253: 1-11 (2021)
C.R. Stilhano Vilas Boas, J.M. Sturm, W.T.E. van den Beld and F. Bijkerk, Oxidation kinetics of transition metals exposed to molecular and atomic oxygen, Materialia 20, 101203: 1-13 (2021)
H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte, Enhancing the detection of laser-excited strain waves via transparent nanolayers, Phys. Rev. B 104, (20), 205416: 1-8 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef, Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology, Opt. Express 29, (23), 38237-38256 (2021)
M.L.S. van der Geest, N. Sadegh, T.M. Meerwijk, E.I. Wooning, L. Wu, E. Bloem, S. Castellanos Ortega, A.M. Brouwer and P.M. Kraus, Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source, Rev. Sci. Instrum. 92, (11), 113004: 1-9 (2021)
R.W. Liefferink, B. Weber, C. Coulais and D. Bonn, Geometric control of sliding friction, Extreme Mech. Lett. 49, 101475: 1-6 (2021)
L. Wu, M.F. Hilbers, O.C.M. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega, Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography, ACS Appl. Mater. Interfaces 13, (43), 51790-51798 (2021)

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