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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • Articles
  • Bachelor Thesis
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  • D.E. Boonzajer Flaes, Reconstructive imaging based on indirect measurements From lensless imaging to waveguide analysis, VU University Amsterdam, 2019-06-11

  • R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot, In situ observations of an active MoS2 model hydrodesulfurization catalyst, Nature Commun. 10, 2546: 1-8 (2019)

  • C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone, Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge, J. Opt. Soc. Am. B 36, (6), 1716-1720 (2019)

  • Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson, Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water, J. Phys. Chem. C 123, (24), 15038-15045 (2019)

  • R.V. Mom, S.T.A.G. Melissen, P. Sautet, J.W.M. Frenken and S.N. Steinmann, The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar, J. Phys. Chem. C 123, (19), 12382-12389 (2019)

  • Y. Zhang, Organotin Photoresists for extreme ultraviolet lithography, University of Amsterdam, 2019-04-11

  • B. Weber, T. Suhina, A.M. Brouwer and D. Bonn, Frictional weakening of slip interfaces, Sci. Adv. 5, (4), eaav7603: 1-7 (2019)

  • D. Kurilovich, Laser-induced dynamics of liquid tin microdroplets, VU University Amsterdam, 2019-04-04

  • G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman, The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts, Appl.Catal.B 243, 145-150 (2019)

  • L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: The role of the organic shell in hybrid molecular materials for EUV lithography In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter