Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • R.W. Liefferink, B. Weber and D. Bonn, Ploughing friction on wet and dry sand, Phys. Rev. E 98, (5), 052903: 1-5 (2018)

  • D. Kurilovich, T. de Faria Pinto, F. Torretti, R. Schupp, J. Scheers, A. Stodolna, H. Gelderblom, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Expansion Dynamics after Laser-Induced Cavitation in Liquid Tin Microdroplets, Phys. Rev. Appl. 10, (5), 054005: 1-8 (2018)

  • R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink, Quantifying single plasmonic nanostructure far -fields with interferometric and polarimetric k-space microscopy, Light : Sci. Appl. 7, 65: 1-11 (2018)

  • S. Edward, A. Antoncecchi, H. Zhang, H.J. Sielcken, S. Witte and P.C.M. Planken, Detection of periodic structures through opaque metal layers by optical measurements of ultrafast electron dynamics, Opt. Express 26, (18), 23380-23396 (2018)

  • S.K. Cushing, M. Zürch, P.M. Kraus, L.M. Carneiro, A. Lee, H.-T. Chang, C.J. Kaplan and S.R. Leone, Hot phonon and carrier relaxation in Si(100) determined by transient extreme ultraviolet spectroscopy, Struct. Dyn. 5, (5), 054302: 1-21 (2018)

  • A. Stodolna, T. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte, Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair, J. Appl. Phys. 124, (5), 053303: 1-7 (2018)

  • G.C. Dong, Y. Zhang and J.W.M. Frenken, Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM, Sci. China-Phys. Mech. Astron. 61, (7), 076811: 1-6 (2018)

  • S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato, Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light, J. Appl. Phys. 124, (1), 013102: 1-7 (2018)

  • P.M. Kraus, M. Zürch, S.K. Cushing, D.M. Neumark and S.R. Leone, The ultrafast X-ray spectroscopic revolution in chemical dynamics, Nat. Rev. Chem. 2, (6), 82-94 (2018)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, Photo-Induced Fragmentation of a Tin-Oxo Cage Compound, J. Photopolymer. Sci.Tec. 31, (2), 243-247 (2018)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 37
  • 38
  • 39
  • 40
  • 41
  • 42
  • 43
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter