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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • J. Haitjema, Exciting tin-oxo cages: light-induced chemistry for nanopatterning, University of Amsterdam, UvA, 2020-06-03

  • R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone, Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide, Phys. Rev. Lett. 124, (20), 207401: 1-6 (2020)

  • S.D.C. Roscam Abbing, F. Campi, F.S. Sajjadian, N. Lin, P. Smorenburg and P.M. Kraus, Divergence Control of High-Harmonic Generation, Phys. Rev. Appl. 13, (5), 054029: 1-9 (2020)

  • J.C.J. Hermens, Are droplet-impact and laser-ablation splashing commutable?, Eindhoven University of Technology, 2020-05-12

  • F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nat. Commun. 11, (1), 2334: 1-8 (2020)

  • L.V. Amitonova and J.F. de Boer, Endo-microscopy beyond the Abbe and Nyquist limits, Light : Sci. Appl. 9, (1), 81: 1-12 (2020)

  • S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W. Coene, Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry, J. Opt. Soc. Am. A 37, (6), 914-924 (2020)

  • C.D. Dieleman, Weiyi Ding, L. Wu, N. Thakur, I. Bespalov, B. Daiber, Y. Ekinci, S. Castellanos Ortega and B. Ehrler, Universal Direct Pattering of Colloidal Quantum Dots by (Extreme) Ultraviolet and Electron Beam Lithography, Nanoscale 12, (20), 11306-11316 (2020)

  • A.L. Klein, D. Kurilovich, H. Lhuissier, O.O. Versolato, D. Lohse, E. Villermaux and H. Gelderblom, Drop fragmentation by laser-pulse impact, J. Fluid Mech. 893, A7: 1-37 (2020)

  • , Splashing by laser ablation of a liquid tin layer on a solid substrate: an investigation of substrate geometry effect on thin film splashing and an analysis of secondary droplet commutability between droplet and laser impact, Eindhoven University of Technology, 2020-04-12

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter