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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte, Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources, Opt. Express 26, (6), 6860-6871 (2018)

  • B. Weber, T. Suhina, T. Junge, L. Pastewka, A.M. Brouwer and D. Bonn, Molecular probes reveal deviations from Amontons' law in multi-asperity frictional contacts, Nature Commun. 9, 888:1-7 (2018)

  • F. Torretti, R. Schupp, D. Kurilovich, A. Bayerle, J. Scheers, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Short-wavelength out-of-band EUV emission from Sn laser-produced plasma, J. Phys. B: At. Mol. Opt. Phys. 51, 045005:1-9 (2018)

  • D. Kurilovich, M.M. Basko, D.A. Kim, F. Torretti, J.C. Visschers, R. Schupp, J. Scheers, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato, Power-law scaling of plasma pressure on laser-ablated tin microdroplets, Phys. Plasmas 25, 012709: 1-10 (2018)

  • R.V. Mom, J. Vermeer, J.W.M. Frenken and I.M.N. Groot, Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2, J.Phys.Chem.B 122, (2), 788-793 (2018)

  • M.F. Jager, C. Ott, C.J. Kaplan, P.M. Kraus, D.M. Neumark and S.R. Leone, Attosecond transient absorption instrumentation for thin film materials: Phase transitions, heat dissipation, signal stabilization, timing correction, and rapid sample rotation, Rev. Sci. Instrum. 89, (1) (2018)

  • A. Thete, D. Geelen, S.J. van der Molen and R.M. Tromp, Charge catastrophe and dielectric breakdown during exposure of organic thin films to low-energy electron radiation, Phys. Rev. Lett. 119, (26), 266803: 1-6 (2017)

  • J.W.M. Frenken: Van grensvlakfysica tot nanolithografie In: Natuurkundige Voordrachten 2016-2017, Koninklijke Maatschappij voor Natuurkunde Diligentia, 2017.

  • H. Gelderblom and O.O. Versolato, Laserschieten op tindruppels, NTvN 83, (11), 382-385 (2017)

  • P. Antonov, Towards thermo- and superlubricity on the macroscopic scale : from nanostructures to graphite and graphene lubrication, Leiden University, 2017-10-18

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter