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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: Zinc-based metal oxoclusters: towards enhanced EUV absorptivity In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11

  • X. Zhou, F.-C. Hsia, Y. Xue, D.-M. Tang, O. Cretu, C. Zhang, M. Mitome, Y. Bando, T. Sasaki and D. Golberg, Tunable Mechanical and Electrical Properties of Coaxial BN-C Nanotubes, Phys Status Solidi Rapid Res Lett 13, (3), 1800576: 1-7 (2019)

  • D.W. van Baarle, S.Yu. Krylov, M.E.S. Beck and J.W.M. Frenken, On the non-trivial origin of atomic-scale patterns in friction force Microscopy, Tribol. Lett. 67, (15) (2019)

  • L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega, Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists, J. of Micro/Nanolithography. MEMS and MOEMS 18, (1) (2019)

  • D. Bodewits and R. Hoekstra, Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules, Atoms 7, (1), 17: 1-11 (2019)

  • L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega, Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications, J. Mater. Chem. C 7, (1), 33-37 (2019)

  • R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink: Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas In: Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, OPG, 2019.

  • J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz, Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition, J. Mater. Chem. A 7, (25), 15233-15243 (2019)

  • F.-C. Hsia, D.-M. Tang, W. Jevasuwan, N. Fukata, X. Zhou, M. Mitome, Y. Bando, T.E.M. Nordling and D. Golberg, Realization and direct observation of five normal and parametric modes in silicon nanowire resonators by in situ transmission electron microscopy, Nanoscale Adv. 1, (5), 1784-1790 (2019)

  • D. Petrova, B. Weber, C. Allain, P. Audebert, D. Bonn and A.M. Brouwer, Fast 3D Microscopy Imaging of Contacts Between Surfaces Using a Fluorescent Liquid, ACS Appl. Mater. Interfaces 10, (48), 40973-40977 (2018)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter