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Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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EUV Plasma Processes
Group leaders:
Dr. Oscar Versolato
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Prof. dr. Ronnie Hoekstra
/
Prof. dr. Wim Ubachs
EUV Plasma Processes
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prof.dr.
Ronnie Hoekstra
Group leader
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prof.
Wim Ubachs
Group leader
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dr.
Oscar Versolato
Group leader
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dr.
Javier Hernandez Rueda
Postdoc
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dr.
Adam Lassise
Postdoc
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Randy Meijer
Postdoc
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dr.
John Sheil
Postdoc
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Ruben Schupp
Junior researcher
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Lars Behnke
PhD student
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Klaas Bijlsma
PhD student
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Zoi Bouza
PhD student
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Diko Hemminga
PhD student
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Bo Liu
PhD student
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Yahia Mostafa
PhD student
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Lucas Poirier
PhD student
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Subam Rai
PhD student
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dr.
Dmitry Kurilovich
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter