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Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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EUV Plasma Processes
Group leaders:
Dr. Oscar Versolato
/
Prof. dr. Ronnie Hoekstra
/
Prof. dr. Wim Ubachs
EUV Plasma Processes
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T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, 2: 93: 1-10 (2021)
O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Extreme ultraviolet light from a tin plasma driven by a 2-si{micrometer}-wavelength laser
, Opt. Express, (2020)
J. Sheil, O.O. Versolato, A.J. Neukirch and J. Colgan,
Multiply-excited states and their contribution to opacity in CO2 laser-driven tin-plasma conditions
, J. Phys. B: At. At. Mol. Opt. Phys., (2020)
J. Scheers,
Charge-state-resolved spectroscopy of multiply-charged tin ions
, VU University Amsterdam, 2020-11-10
S. Rai, K.I. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra,
Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
482
, 58-63 (2020)
Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas
, J. Phys. B: At. At. Mol. Opt. Phys.
53
, 19: 195001: 1-11 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij,
Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level
, Science
369
, 6508: 1238-1241 (2020)
J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma
, Phys.Rev.E
102
, 1: 013204: 1-9 (2020)
J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap
, Phys. Rev. A
101
, 6: 062511: 1-11 (2020)
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan,
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
, Nature Commun.
11
, 1: 2334: 1-8 (2020)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
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