Publications - ARCNL

View our latest publications

K. Bijlsma, Electron capture in collisions of tin ions with molecular hydrogen, University of Groningen, 2024-06-18
H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato, Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets, Phys. Rev. Res. 6, (2), 023182: 1-12 (2024)
S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox, Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources, Appl. Phys. Lett. 124, (17), 174101: 1-8 (2024)
K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil, Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations, Appl. Phys. Lett. 124, (10), 102104 : 1-7 (2024)
D.J. Engels, R.A. Meijer, H.K. Schubert, W.J. van der Zande, W.M.G. Ubachs and O.O. Versolato, High-resolution spectroscopic imaging of atoms and nanoparticles in thin film vaporization, Appl. Phys. Lett. 123, (25), 254102 : 1-7 (2023)
Y. Mostafa, L. Behnke, D.J. Engels, Z. Bouza, J. Sheil, W.M.G. Ubachs and O.O. Versolato, Production of 13.5 nm light with 5% conversion efficiency from 2 μm laser-driven tin microdroplet plasma, Appl. Phys. Lett. 123, (23), 234101: 1-7 (2023)
D.J. Hemminga, Single-fluid radiation-hydrodynamic modeling of laser-driven EUV-emitting plasmas, VU University Amsterdam, 2023-11-20
R.A. Wilhelm, M.J. Deuzeman, S. Rai, W. Husinsky, P.S. Szabo, H. Biber, R. Stadlmayr, C. Cupak, J. Hundsbichler, C. Lemell, M. Möller, A. Mutzke, G. Hobler, O.O. Versolato, F. Aumayr and R. Hoekstra, On the missing single collision peak in low energy heavy ion scattering, Nucl. Instrum. Methods. Phys. Res., Sect B 544, 165123: 1-12 (2023)
J. Sheil, O.O. Versolato, V. Bakshi and H. Scott, Review of the 1st EUV Light Sources Code Comparison Workshop, Atoms 11, (10), 130: 1-18 (2023)
Z. Bouza, Developments for broadband spectral and spatial characterization of tin plasma light sources for EUV lithography, VU University Amsterdam, 2023-10-06

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2024