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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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EUV Plasma Processes
Group leaders:
Dr. Oscar Versolato
/
Prof. dr. Wim Ubachs
EUV Plasma Processes
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J. Sheil, J. Colgan and O.O. Versolato:
Atomic Origins of EUV Light
In:
Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE., 2023. - pp. 111-148
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar,
Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates
, Opt. Lett.
48
, (16), 4316-4318 (2023)
L. Poirier, A. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato,
Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range
, Phys. Plasmas
30
, (8), 083505 : 1-10 (2023)
L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D. Engels, W.M.G. Ubachs and O.O. Versolato,
High-energy parametric oscillator and amplifier pulsed light source at 2-μm
, Opt. Express
31
, (15), 24142-24156 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato,
Mass partitioning in fragmenting tin sheets
, Phys. Rev. Appl.
20
, (1), 014048: 1-18 (2023)
D.J. Hemminga, O.O. Versolato and J. Sheil,
Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources
, Phys. Plasmas
30
, (3), 033301: 1-9 (2023)
S. Rai, K.I. Bijlsma, L. Poirier, E. de Wit, L. Assink, A. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra,
Evidence of production of keV Sn
+
ions in the H
2
buffer gas surrounding an Sn-plasma EUV source
, Plasma Sources Sci. Technol.
32
, (3), 035006: 1-9 (2023)
S. Rai,
Ionic interactions around EUV generating tin plasma
, University of Groningen, 2023-02-28
B. Liu,
Morphology of liquid tin sheets formed by laser impact on droplets
, VU University Amsterdam, 2022-12-13
L. Poirier, D.J. Hemminga, A. Lassise, L. Assink, R. Hoekstra, J. Sheil and O.O. Versolato,
Strongly anisotropic ion emission in the expansion of Nd:YAG-laser-produced plasma
, Phys. Plasmas
29
, (12), 123102: 1-11 (2022)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter