Publications - ARCNL

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J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE., 2023. - pp. 111-148
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar, Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, Opt. Lett. 48, (16), 4316-4318 (2023)
L. Poirier, A. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)
L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D. Engels, W.M.G. Ubachs and O.O. Versolato, High-energy parametric oscillator and amplifier pulsed light source at 2-μm, Opt. Express 31, (15), 24142-24156 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato, Mass partitioning in fragmenting tin sheets, Phys. Rev. Appl. 20, (1), 014048: 1-18 (2023)
D.J. Hemminga, O.O. Versolato and J. Sheil, Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources, Phys. Plasmas 30, (3), 033301: 1-9 (2023)
S. Rai, K.I. Bijlsma, L. Poirier, E. de Wit, L. Assink, A. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra, Evidence of production of keV Sn⁺ ions in the H₂ buffer gas surrounding an Sn-plasma EUV source, Plasma Sources Sci. Technol. 32, (3), 035006: 1-9 (2023)
S. Rai, Ionic interactions around EUV generating tin plasma, University of Groningen, 2023-02-28
B. Liu, Morphology of liquid tin sheets formed by laser impact on droplets, VU University Amsterdam, 2022-12-13
L. Poirier, D.J. Hemminga, A. Lassise, L. Assink, R. Hoekstra, J. Sheil and O.O. Versolato, Strongly anisotropic ion emission in the expansion of Nd:YAG-laser-produced plasma, Phys. Plasmas 29, (12), 123102: 1-11 (2022)

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