Publications - EUV Plasma Processes - ARCNL

H.L. França, H.K. Schubert, O.O. Versolato and M. Jalaal, Laser-induced droplet deformation: curvature inversion explained from instantaneous pressure impulse, J. Fluid Mech. 1020, A21: 1-29 (2025)
H.K. Schubert, D.J. Engels, M. Kharbedia, H. Gelderblom and O.O. Versolato, Observation of discrete concentric surface modulations on free-flying liquid tin sheets, Phys. Fluids 37, (9), 094108: 1-13 (2025)
R. Van Straaten, Measuring the energy spectrum of tin ions from a laser produced plasma in a single shot., VU University Amsterdam, 2025-07-09
T. Bierens, Comparing the simulation thickness profile and expansion curve to those of experiments, VU University Amsterdam, 2025-07-09
D.J. Engels, H.K. Schubert, M. Kharbedia, W.M.G. Ubachs and O.O. Versolato, Spectroscopic imaging of tin vapor near plasma threshold, Phys. Rev. Res. 7, (2), 023307: 1-8 (2025)
, Development of an experimental setup to study droplet dynamics at micro- and millimeter scale, University of Groningen, 2025-05-15
E.J. Salumbides, Y. Ezzo, Z. Mazzotta, W.M.G. Ubachs, K.S.E. Eikema, O.O. Versolato and S. Witte, Arbitrary pulse shaping in a mid-infrared optical parametric oscillator source, Opt. Express 33, (10), 20656-20663 (2025)
L. de Reus, Investigating Tin Vapor Broadening and Shifting Mechanisms for Gas Parameter Extraction Using UV Shadowgraphy, Eindhoven University of Technology, 2025-04-09
Y. Mostafa, Mass & Energy Efficient Tin Laser Produced Plasma Light Sources, VU University Amsterdam, 2025-01-10
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam, Plasma sources for advanced semiconductor applications, Appl. Phys. Lett. 125, (23), 230401: 1-9 (2024)

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