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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Plasma Processes
I. Babenko, Y. Mostafa, Z. Bouza, O.O. Versolato and M. Bayraktar,
Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates
, AIP Advances
14
, (10), 105021: 1-7 (2024)
S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil,
Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography
, Plasma Sources Sci. Technol.
33
, (10), 105003: 1-14 (2024)
J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato,
Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas
, Phys. Rev. Lett.
133
, (12), 125101: 1-6 (2024)
L. Assink, J. Brötzner, C. Cupak, M. Salverda, H.T. Jonkman, O.O. Versolato, R.A. Wilhelm and R. Hoekstra,
On the question whether surface roughness can explain the absence of a prominent single-collision peak in keV heavy-ion scattering off a polycrystalline Ru surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
554
, 165442: 1-6 (2024)
K. Bijlsma,
Electron capture in collisions of tin ions with molecular hydrogen
, University of Groningen, 2024-06-18
H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato,
Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets
, Phys. Rev. Res.
6
, (2), 023182: 1-12 (2024)
S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox,
Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources
, Appl. Phys. Lett.
124
, (17), 174101: 1-8 (2024)
K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil,
Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations
, Appl. Phys. Lett.
124
, (10), 102104 : 1-7 (2024)
D.J. Engels, R.A. Meijer, H.K. Schubert, W.J. van der Zande, W.M.G. Ubachs and O.O. Versolato,
High-resolution spectroscopic imaging of atoms and nanoparticles in thin film vaporization
, Appl. Phys. Lett.
123
, (25), 254102 : 1-7 (2023)
Y. Mostafa, L. Behnke, D.J. Engels, Z. Bouza, J. Sheil, W.M.G. Ubachs and O.O. Versolato,
Production of 13.5 nm light with 5% conversion efficiency from 2 μm laser-driven tin microdroplet plasma
, Appl. Phys. Lett.
123
, (23), 234101: 1-7 (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter