Publications - EUV Plasma Processes - ARCNL

D.J. Hemminga, Single-fluid radiation-hydrodynamic modeling of laser-driven EUV-emitting plasmas, VU University Amsterdam, 2023-11-20
R.A. Wilhelm, M.J. Deuzeman, S. Rai, W. Husinsky, P.S. Szabo, H. Biber, R. Stadlmayr, C. Cupak, J. Hundsbichler, C. Lemell, M. Möller, A. Mutzke, G. Hobler, O.O. Versolato, F. Aumayr and R. Hoekstra, On the missing single collision peak in low energy heavy ion scattering, Nucl. Instrum. Methods. Phys. Res., Sect B 544, 165123: 1-12 (2023)
J. Sheil, O.O. Versolato, V. Bakshi and H. Scott, Review of the 1st EUV Light Sources Code Comparison Workshop, Atoms 11, (10), 130: 1-18 (2023)
Z. Bouza, Developments for broadband spectral and spatial characterization of tin plasma light sources for EUV lithography, VU University Amsterdam, 2023-10-06
L. Poirier, Ion diagnostics for Extreme Ultraviolet Nanolithography, VU University Amsterdam, 2023-10-06
L. Behnke, Efficient EUV Light Plasma Sources Driven by a 2-μm-Wavelength Laser, VU University Amsterdam, 2023-10-02
J. Vandersmissen, R.A. Meijer, J. Sukham, A. Erkelens, A. Jan Bonne and E. Verhagen, Optical readout and actuation of plasmonic nano-optomechanical drum resonators, Opt. Mater. Express 13, (10), 2979-2996 (2023)
J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar, Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, Opt. Lett. 48, (16), 4316-4318 (2023)
L. Poirier, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)

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