Publications - EUV Plasma Processes - ARCNL

L. Behnke, Efficient EUV Light Plasma Sources Driven by a 2-μm-Wavelength Laser, VU University Amsterdam, 2023-10-02
J. Vandersmissen, R.A. Meijer, J. Sukham, A. Erkelens, A. Jan Bonne and E. Verhagen, Optical readout and actuation of plasmonic nano-optomechanical drum resonators, Opt. Mater. Express 13, (10), 2979-2996 (2023)
J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar, Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, Opt. Lett. 48, (16), 4316-4318 (2023)
L. Poirier, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)
L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D.J. Engels, W.M.G. Ubachs and O.O. Versolato, High-energy parametric oscillator and amplifier pulsed light source at 2-μm, Opt. Express 31, (15), 24142-24156 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato, Mass partitioning in fragmenting tin sheets, Phys. Rev. Appl. 20, (1), 014048: 1-18 (2023)
D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato: Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography In: Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.
D.J. Hemminga, O.O. Versolato and J. Sheil, Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources, Phys. Plasmas 30, (3), 033301: 1-9 (2023)
S. Rai, K. Bijlsma, L. Poirier, E. de Wit, L. Assink, A.C. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra, Evidence of production of keV Sn⁺ ions in the H₂ buffer gas surrounding an Sn-plasma EUV source, Plasma Sources Sci. Technol. 32, (3), 035006: 1-9 (2023)

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