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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Plasma Processes
L. Poirier, A.C. Lassise, Y. Mostafa, L. Behnke, N. Braaksma, L. Assink, R. Hoekstra and O.O. Versolato,
Energy- and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer
, Appl. Phys. B- Lasers O
128
, (7), 135: 1-7 (2022)
R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte,
Nanosecond laser ablation threshold of liquid tin microdroplets
, Appl. Phys. A
128
, (7), 570: 1-8 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
, J. Opt.
24
, (5), 054014: 1-13 (2022)
R.A. Meijer, D. Kurilovich, K.S.E. Eikema, O.O. Versolato and S. Witte,
The transition from short- to long-timescale pre-pulses: Laser-pulse impact on tin microdroplets
, J. Appl. Phys.
131
, (10), 105905: 1-11 (2022)
J. Hernandez-Rueda, B. Liu, D.J. Hemminga, Y. Mostafa, R.A. Meijer, D. Kurilovich, M.M. Basko, H. Gelderblom, J. Sheil and O.O. Versolato,
Early-time hydrodynamic response of a tin droplet driven by laser-produced plasma
, Phys. Rev. Res.
4
, (1), 013142: 1-14 (2022)
L. Poirier, A. Bayerle, A.C. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra,
Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma
, Appl. Phys. B- Lasers O
128
, (3), 39: 1-11 (2022)
Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato,
The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
, AIP Advances
11
, (12), 125003: 1-9 (2021)
D.J. Hemminga, L. Poirier, M.M. Basko, R. Hoekstra, W.M.G. Ubachs, O.O. Versolato and J. Sheil,
High-energy ions from Nd:YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model
, Plasma Sources Sci. Technol.
30
, (10), 105006: 1-10 (2021)
Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte:
TI-REX: A Tunable Infrared laser for Experiments in nanolithography
In:
, IEEE, 2021.
R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte,
Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets
, Phys. Rev. Appl.
16
, (2), 024026: 1-11 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter