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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Plasma Processes
S. Rai, K. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra,
Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
482
, 58-63 (2020)
Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas
, J. Phys. B: At. Mol. Opt. Phys.
53
, (19), 195001: 1-11 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij,
Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level
, Science
369
, (6508), 1238-1241 (2020)
J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma
, Phys. Rev. E
102
, (1), 013204: 1-9 (2020)
J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap
, Phys. Rev. A
101
, (6), 062511: 1-11 (2020)
O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte,
Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
, J. Phys.: Conf. Ser.
1412
, (19), 192006:1-1 (2020)
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan,
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
, Nature Commun.
11
, (1), 2334: 1-8 (2020)
A.L. Klein, D. Kurilovich, H. Lhuissier, O.O. Versolato, D. Lohse, E. Villermaux and H. Gelderblom,
Drop fragmentation by laser-pulse impact
, J. Fluid Mech.
893
, A7: 1-37 (2020)
G. de Haan, J. Hernandez-Rueda and P.C.M. Planken,
Femtosecond time-resolved pump-probe measurements on percolating gold in the ablation regime
, Opt. Express
28
, (8), 12093-12107 (2020)
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato,
Mass loss from a stretching semitransparent sheet of liquid tin
, Phys. Rev. Appl.
13
, (2), 024035: 1-10 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter