Publications - EUV Plasma Processes - ARCNL

F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Spectral characterization of an industrial EUV light source for nanolithography, J. Phys. D: Appl. Phys. 53, (5), 055204: 1-7 (2020)
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato: Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.
Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte: Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.
F. Torretti, Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography, VU University Amsterdam, 2019-12-19
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma, Appl. Phys. Lett. 115, (12), 124101: 1-6 (2019)
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan, Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions, J. Phys. B: At. Mol. Opt. Phys. 52, (17), 171002: 1-49 (2019)
O.O. Versolato, Physics of laser-driven tin plasma sources of EUV radiation for nanolithography, Plasma Sources Sci. Technol. 28, (8), 083001:1-17 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma, Phys. Rev. Appl. 12, (1), 014010: 1-11 (2019)
M.J. Deuzeman, Generation and interactions of energetic tin ions, University of Groningen, 2019-06-21
D. Kurilovich, Laser-induced dynamics of liquid tin microdroplets, VU University Amsterdam, 2019-04-04

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