Publications - EUV Plasma Processes - ARCNL

J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato, EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap, Phys. Rev. A 101, (6), 062511: 1-11 (2020)
O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte, Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography, J. Phys.: Conf. Ser. 1412, (19), 192006:1-1 (2020)
J.C.J. Hermens, Are droplet-impact and laser-ablation splashing commutable?, Eindhoven University of Technology, 2020-05-12
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)
A.L. Klein, D. Kurilovich, H. Lhuissier, O.O. Versolato, D. Lohse, E. Villermaux and H. Gelderblom, Drop fragmentation by laser-pulse impact, J. Fluid Mech. 893, A7: 1-37 (2020)
, Splashing by laser ablation of a liquid tin layer on a solid substrate: an investigation of substrate geometry effect on thin film splashing and an analysis of secondary droplet commutability between droplet and laser impact, Eindhoven University of Technology, 2020-04-12
G. de Haan, J. Hernandez-Rueda and P.C.M. Planken, Femtosecond time-resolved pump-probe measurements on percolating gold in the ablation regime, Opt. Express 28, (8), 12093-12107 (2020)
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato, Mass loss from a stretching semitransparent sheet of liquid tin, Phys. Rev. Appl. 13, (2), 024035: 1-10 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Spectral characterization of an industrial EUV light source for nanolithography, J. Phys. D: Appl. Phys. 53, (5), 055204: 1-7 (2020)
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato: Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.

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