Publication date | 18 September 2024 |
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DOI | http://dx.doi.org/10.1088/1361-6595/ad7c7c |
Reference | S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil, Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography, Plasma Sources Sci. Technol., (2024) |
Groups | EUV Plasma Processes, Plasma Theory and Modeling |
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