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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma, Phys. Rev. Appl. 12, (1), 014010: 1-11 (2019)

  • M.J. Deuzeman, Generation and interactions of energetic tin ions, University of Groningen, 2019-06-21

  • L. Serafini, A. Bacci, A. Bellandi, M. Bertucci, M. Bolognesi, A. Bosotti, F. Broggi, R. Calandrino, F. Camera, F. Canella, S. Capra, P. Cardarelli, M. Carrara, K. Cassou, A. Castoldi, R. Castriconi, G.M. Cattaneo, S. Cialdi, A. Cianchi, N. Coluccelli, C. Curatolo, A. Del Vecchio, S. Di Mitri, I. Drebot, K. Dupraz, A. Esposito, L. Faillace, M. Ferrario, C. Fiorini, C. Galzerano, M. Gambaccini, G. Ghiringhelli, D. Giannotti, D. Giove, F. Groppi, C. Guazzoni, P. Laporta, S. Leoni, A. Loria, P. Mangili, A. Martens, T. Mazza, Z. Mazzotta, C. Meroni, G. Mettivier, P. Michelato, L. Monaco, S. Morante, M.M. Sala, D. Nutarelli, S. Olivares, G. Onida, M. Opromolla, C. Pagani, R. Paparella, M.G.A. Paris, B. Paroli, G. Paterno, C. Paulin, L. Perini, M. Petrarca, V. Petrillo, E. Pinotti, P. Piser, M.A.C. Potenza, F. Prelz, A. Pullia, E. Puppin, F. Ragusa, R. Ramponi, M. Rome, M.R. Conti, A.R. Rossi, L. Rossi, M. Ruijter, P. Russo, S. Samsam, A. Sarno, D. Sertore, M. Sorbi, B. Spataro, M. Statera, G. Turchetti, C. Vaccarezza, R. Valdagni, A. Vanzulli, F. Zomer and G. Rossi, MariX, an advanced MHz-class repetition rate X-ray source for linear regime time-resolved spectroscopy and photon scattering, Nucl. Instrum. Methods Phys. Res., Sect. A 930, (21), 167-172 (2019)

  • D.E. Boonzajer Flaes, Reconstructive imaging based on indirect measurements From lensless imaging to waveguide analysis, Vrije Universiteit Amsterdam, VU, 2019-06-11

  • R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot, In situ observations of an active MoS2 model hydrodesulfurization catalyst, Nat. Commun. 10, 2546: 1-8 (2019)

  • C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone, Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge, J. Opt. Soc. Am. B 36, (6), 1716-1720 (2019)

  • Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson, Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water, J. Phys. Chem. C 123, (24), 15038-15045 (2019)

  • R.V. Mom, S.T.A.G. Melissen, P. Sautet, J.W.M. Frenken and S.N. Steinmann, The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar, J. Phys. Chem. C 123, (19), 12382-12389 (2019)

  • Y. Zhang, Organotin Photoresists for extreme ultraviolet lithography, University of Amsterdam, UvA, 2019-04-11

  • B. Weber, T. Suhina, A.M. Brouwer and D. Bonn, Frictional weakening of slip interfaces, Sci. Adv. 5, (4), eaav7603: 1-7 (2019)

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter