Logo
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter
Directory
menu
Search
Publications - EUV Generation & Imaging
L. Loetgering, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper, K.S.E. Eikema and S. Witte,
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
, Optica
8
, (2), 130-138 (2021)
T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, (2), 93: 1-10 (2021)
J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk,
Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation
, OSA Continuum
4
, (1), 121-121 (2021)
R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, (25), 37419-37435 (2020)
A. Schulte, J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High Harmonic Generation in Laser-Produced Plasma
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, OSA Technical Digest (Optical Society of America), 2020.
A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte,
High-resolution microscopy through optically opaque media using ultrafast photoacoustics
, Opt. Express
28
, (23), 33937-33947 (2020)
V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken,
Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures
, Appl. Opt.
59
, (30), 9499-9509 (2020)
V. Verrina, S. Edward, H. Zhang, S. Witte and P.C.M. Planken,
Photoacoustic detection of low duty cycle gratings through optically opaque layers
, Appl. Phys. Lett.
117
, (5), 051104: 1-6 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij,
Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level
, Science
369
, (6508), 1238-1241 (2020)
Logo
Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter