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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Directory

Publications - EUV Generation & Imaging

  • J.L. Ellis, K.M. Dorney, D.D. Hickstein, N.J. Brooks, C. Gentry, C. Hernández-García, D. Zusin, J.M. Shaw, Q.L. Nguyen, C.A. Mancuso, G.S. Jansen, S. Witte, H.C. Kapteyn and M.M. Murnane, High harmonics with spatially varying ellipticity, Optica 5, (4), 479-485 (2018)

  • A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, T. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Sn ion energy distributions of ns- and ps-laser produced plasmas, Plasma Sources Sci. Technol. 27, 045001:1-8 (2018)

  • L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte, Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources, Opt. Express 26, (6), 6860-6871 (2018)

  • R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte, High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability, Opt. Lett. 42, (14), 2758-2761 (2017)

  • M.J. Deuzeman, A. Stodolna, E.E.B. Leerssen, A. Antoncecchi, N. Spook, T. Kleijntjens, J. Versluis, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target, J. Appl. Phys. 121, (10), 103301: 1-8 (2017)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter