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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
A. Stodolna, T. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte,
Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair
, J. Appl. Phys.
124
, (5), 053303: 1-7 (2018)
G.S.M. Jansen, A.C.C. de Beurs, X. Liu, K.S.E. Eikema and S. Witte,
Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging
, Opt. Express
26
, (10), 12479-12489 (2018)
J.L. Ellis, K.M. Dorney, D.D. Hickstein, N.J. Brooks, C. Gentry, C. Hernández-García, D. Zusin, J.M. Shaw, Q.L. Nguyen, C.A. Mancuso, G.S. Jansen, S. Witte, H.C. Kapteyn and M.M. Murnane,
High harmonics with spatially varying ellipticity
, Optica
5
, (4), 479-485 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, T. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Sn ion energy distributions of ns- and ps-laser produced plasmas
, Plasma Sources Sci. Technol.
27
, 045001:1-8 (2018)
L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte,
Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources
, Opt. Express
26
, (6), 6860-6871 (2018)
R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte,
High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability
, Opt. Lett.
42
, (14), 2758-2761 (2017)
M.J. Deuzeman, A. Stodolna, E.E.B. Leerssen, A. Antoncecchi, N. Spook, T. Kleijntjens, J. Versluis, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target
, J. Appl. Phys.
121
, (10), 103301: 1-8 (2017)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
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Events
Repository
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