Publications - EUV Generation & Imaging - ARCNL

O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte, Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography, J. Phys.: Conf. Ser. 1412, (19), 192006:1-1 (2020)
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)
S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W.M.J. Coene, Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry, J. Opt. Soc. Am. A 37, (6), 914-924 (2020)
C. Messinis, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef, Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons, Appl. Opt. 59, (11), 3498-3507 (2020)
L. Loetgering, M. Du, K.S.E. Eikema and S. Witte, zPIE: an autofocusing algorithm for ptychography, Opt. Lett. 45, (7), 2030-2033 (2020)
P.C. Konda, L. Loetgering, K.C. Zhou, S. Xu, A.R. Harvey and R. Horstmeyer, Fourier ptychography: current applications and future promises, Opt. Express 28, (7), 9603-9630 (2020)
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte, Generation and characterization of focused helical x-ray beams, Sci. Adv. 6, (7), eaax8836: 1-6 (2020)
A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W.M.J. Coene, K.S.E. Eikema and S. Witte, Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry, Opt. Express 28, (4), 5257-5266 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Measuring laser beam quality, wavefronts, and lens aberrations using ptychography, Opt. Express 28, (4), 5022-5034 (2020)
G.S. Jansen, Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology, VU University Amsterdam, 2020-01-10

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