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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
S. Edward, H. Zhang, S. Witte and P.C.M. Planken,
Laser-induced ultrasonics for detection of low-amplitude grating through metal layers with finite roughness
, Opt. Express
28
, (16), 23374-23387 (2020)
S. Edward, H. Zhang, I. Setija, V. Verrina, A. Antoncecchi, S. Witte and P.C.M. Planken,
Detection of hidden gratings through multilayer nanostructures using light and sound
, Phys. Rev. Appl.
14
, (1), 014015-1-16 (2020)
C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef:
Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.
H. Zhang, J.-P. Colombier and S. Witte,
Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states
, Phys. Rev. B
101
, (24), 245430: 1-15 (2020)
O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte,
Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
, J. Phys.: Conf. Ser.
1412
, (19), 192006:1-1 (2020)
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan,
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
, Nature Commun.
11
, (1), 2334: 1-8 (2020)
S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W. Coene,
Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry
, J. Opt. Soc. Am. A
37
, (6), 914-924 (2020)
C. Messinis, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef,
Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons
, Appl. Opt.
59
, (11), 3498-3507 (2020)
L. Loetgering, M. Du, K.S.E. Eikema and S. Witte,
zPIE: an autofocusing algorithm for ptychography
, Opt. Lett.
45
, (7), 2030-2033 (2020)
P.C. Konda, L. Loetgering, K.C. Zhou, S. Xu, A.R. Harvey and R. Horstmeyer,
Fourier ptychography: current applications and future promises
, Opt. Express
28
, (7), 9603-9630 (2020)
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Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter