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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
V. Verrina,
Laser-induced ultrasound for the detection of buried micro- and nano-structures
, University of Amsterdam, 2021-04-06
R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering,
Spatial coherence control and analysis via micromirror-based mixed-state ptychography
, New J. Phys.
23
, 053016: 1-15 (2021)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Ptychographic optical coherence tomography
, Opt. Lett.
46
, (6), 1337-1340 (2021)
B. Liu, R.A. Meijer, J. Hernandez-Rueda, D. Kurilovich, Z. Mazzotta, S. Witte and O.O. Versolato,
Laser-induced vaporization of a stretching sheet of liquid tin
, J. Appl. Phys.
129
, (5), 053302: 1-7 (2021)
H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte,
Ultrafast laser-induced guided elastic waves in a freestanding aluminum membrane
, Phys. Rev. B
103
, (6), 064303: 1-10 (2021)
L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Extreme ultraviolet light from a tin plasmadriven by a 2-μm-wavelength laser
, Opt. Express
29
, (3), 4475-4487 (2021)
L. Loetgering, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper, K.S.E. Eikema and S. Witte,
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
, Optica
8
, (2), 130-138 (2021)
T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, (2), 93: 1-10 (2021)
J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk,
Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation
, OSA Continuum
4
, (1), 121-121 (2021)
R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter