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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
X. Liu, L. Loetgering, A.C.C. de Beurs, M. Du, P. Konold, K.S.E. Eikema and S. Witte:
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte:
TI-REX: A Tunable Infrared laser for Experiments in nanolithography
In:
, IEEE, 2021.
R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte,
Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets
, Phys. Rev. Appl.
16
, (2), 024026: 1-11 (2021)
A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte:
aPIE: Angle calibration algorithm for reflection ptychography
In:
OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
A. Pelekanidis, L. Loetgering and S. Witte:
Ptychography-based characterization of wavelength-tunable vortex beams
In:
Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse:
Towards Multimode-fiber-based Two-photon Endoscopy
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High-Order Harmonic Generation in Laser Produced Plasmas
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef:
Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy
In:
Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.
M. Du,
Computational Depth-resolved Imaging and Metrology
, VU University Amsterdam, 2021-06-09
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
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Events
Repository
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ARCNL Newsletter