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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte,
Generation and characterization of focused helical x-ray beams
, Sci. Adv.
6
, (7), eaax8836: 1-6 (2020)
A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema and S. Witte,
Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry
, Opt. Express
28
, (4), 5257-5266 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Measuring laser beam quality, wavefronts, and lens aberrations using ptychography
, Opt. Express
28
, (4), 5022-5034 (2020)
G.S. Jansen,
Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology
, VU University Amsterdam, 2020-01-10
H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte,
Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound
, Phys. Rev. Appl.
13
, (1), 014010: 1-14 (2020)
J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte:
Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.
Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte:
Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.
M. Du, K.S.E. Eikema and S. Witte,
Computational-imaging-based optical coherence tomography in time- and frequency-domain
, OSA Continuum
2
, (11), 3141-3152 (2019)
T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema,
An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm
, Opt. Express
27
, (21), 29829-29837 (2019)
S. Witte and A.J. den Boef,
Lensloze microscopie
, NTvN, (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
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ARCNL Newsletter