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Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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EUV Generation & Imaging
Group leaders:
Dr. Stefan Witte
/
Prof. dr. Kjeld Eikema
EUV Generation & Imaging
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Latest Publications
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T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, 2: 93: 1-10 (2021)
O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Extreme ultraviolet light from a tin plasma driven by a 2-si{micrometer}-wavelength laser
, Opt. Express, (2020)
L. Loetgering, S. Witte, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper and K.S.E. Eikema,
Extreme ultraviolet multispectral ptychography with minimum entropy beams
, Optica, (2020)
R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, 25: 37419-37435 (2020)
A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte,
High-resolution microscopy through optically opaque media using ultrafast photoacoustics
, Opt. Express
28
, 23: 33937-33947 (2020)
V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken,
Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures
, Appl.Opt.
59
, 30: 9499-9509 (2020)
V. Verrina, S. Edward, H. Zhang, S. Witte and P.C.M. Planken,
Photoacoustic detection of low duty cycle gratings through optically opaque layers
, Appl.Phys.Lett.
117
, 5: 051104: 1-6 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij,
Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level
, Science
369
, 6508: 1238-1241 (2020)
S. Edward, H. Zhang, S. Witte and P.C.M. Planken,
Laser-induced ultrasonics for detection of low-amplitude grating through metal layers with finite roughness
, Opt. Express
28
, 16: 23374-23387 (2020)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter