Publications - ARCNL

EUV Generation & Imaging

Group leaders: Dr. Stefan Witte / Prof. dr. Kjeld Eikema

T. de Faria Pinto, Interactions between ultrashort pulses and laser-produced tin plasmas, VU University Amsterdam, 2023-11-27
X. Liu, A. Pelekanidis, M. Du, F. Zhang, K.S.E. Eikema and S. Witte, Observation of chromatic effects in high-order harmonic generation, Phys. Rev. Res. 5, (4), 043100: 1-9 (2023)
M.C. Velsink, M. Illienko, P. Sudera and S. Witte, Optimizing pump–probe reflectivity measurements of ultrafast photoacoustics with modulated asynchronous optical sampling, Rev. Sci. Instrum. 94, (10), 103002: 1-10 (2023)
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte, Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics, Appl. Phys. B- Lasers O 129, 91: 1-11 (2023)
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte, PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography, Opt. Express 31, (9), 13763-13797 (2023)
S.D.C. Roscam Abbing, Control over extreme-ultraviolet high-harmonic generation from gases and solids, VU University Amsterdam, 2023-03-27
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte, High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams, Optica 10, (2), 255-263 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)
C. Messinis, Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology, VU University Amsterdam, 2022-11-29

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