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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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EUV Generation & Imaging
Group leaders:
Dr. Stefan Witte
/
Prof. dr. Kjeld Eikema
EUV Generation & Imaging
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Latest Publications
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T. de Faria Pinto,
Interactions between ultrashort pulses and laser-produced tin plasmas
, VU University Amsterdam, 2023-11-27
X. Liu, A. Pelekanidis, M. Du, F. Zhang, K.S.E. Eikema and S. Witte,
Observation of chromatic effects in high-order harmonic generation
, Phys. Rev. Res.
5
, (4), 043100: 1-9 (2023)
M.C. Velsink, M. Illienko, P. Sudera and S. Witte,
Optimizing pump–probe reflectivity measurements of ultrafast photoacoustics with modulated asynchronous optical sampling
, Rev. Sci. Instrum.
94
, (10), 103002: 1-10 (2023)
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef:
Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy
In:
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte,
Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics
, Appl. Phys. B- Lasers O
129
, 91: 1-11 (2023)
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte,
PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography
, Opt. Express
31
, (9), 13763-13797 (2023)
S.D.C. Roscam Abbing,
Control over extreme-ultraviolet high-harmonic generation from gases and solids
, VU University Amsterdam, 2023-03-27
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte,
High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams
, Optica
10
, (2), 255-263 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef,
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology
, Opt. Express
31
, (1), 411-425 (2023)
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
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Events
Repository
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