Publications - ARCNL

EUV Generation & Imaging

Group leaders: Dr. Stefan Witte / Prof. dr. Kjeld Eikema

R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte, Nanosecond laser ablation threshold of liquid tin microdroplets, Appl. Phys. A 128, (7), 570: 1-8 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef, Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects, Opt. Continuum 1, (5), 1202-1217 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra, Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review), J.Opt. 5, 054014: 1-13 (2022)
A.C.C. de Beurs, L. Lötgering, M. Herczog, M. Du, K.S.E. Eikema and S. Witte, aPIE: an angle calibration algorithm for reflection ptychography, Opt. Lett. 47, (8), 1949-1952 (2022)
A. Antoncecchi, Laser-ultrasonics and imaging through metal layers, VU University Amsterdam, 2022-03-30
R.A. Meijer, D. Kurilovich, K.S.E. Eikema, O.O. Versolato and S. Witte, The transition from short- to long-timescale pre-pulses: Laser-pulse impact on tin microdroplets, J. Appl. Phys 131, (10), 105905: 1-11 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor, J. Micro/Nanopattern. Mats. Metro 21, (1), 014001: 1-10 (2022)
L. Lötgering, S. Witte and J. Rothhardt, Advances in laboratory-scale ptychography using high harmonic sources [Invited], Opt. Express 30, (3), 4133-4164 (2022)
H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte, Enhancing the detection of laser-excited strain waves via transparent nanolayers, Phys.Rev.B 104, (20), 205416: 1-8 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef, Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology, Opt. Express 29, (23), 38237-38256 (2021)

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