Logo
Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter
Directory
menu
Search
EUV Generation & Imaging
Group leaders:
Dr. Stefan Witte
/
Prof. dr. Kjeld Eikema
EUV Generation & Imaging
Research activities
News
Publications
Jobs & Internships
Back to group
Latest Publications
View more publications
V. Verrina,
Laser-induced ultrasound for the detection of buried micro- and nano-structures
, University of Amsterdam, 2021-04-06
R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering,
Spatial coherence control and analysis via micromirror-based mixed-state ptychography
, New J. Phys., (2021)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Ptychographic optical coherence tomography
, Opt. Lett.
46
, 6: 1337-1340 (2021)
B. Liu, R.A. Meijer, J. Hernandez-Rueda, D. Kurilovich, Z. Mazzotta, S. Witte and O.O. Versolato,
Laser-induced vaporization of a stretching sheet of liquid tin
, J. Appl. Phys
129
, 5: 053302: 1-7 (2021)
H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte,
Ultrafast laser-induced guided elastic waves in a freestanding aluminum membrane
,
103
, 6: 064303: 1-10 (2021)
O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Extreme ultraviolet light from a tin plasmadriven by a 2-μm-wavelength laser
, Opt. Express
29
, 3: 4475-4487 (2021)
L. Loetgering, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper, K.S.E. Eikema and S. Witte,
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
, Optica
8
, 2: 130-138 (2021)
T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, 2: 93: 1-10 (2021)
J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk,
Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation
, OSA Continuum
4
, 1: 121-121 (2021)
M. Vieille-Grosjean, E. Dimova, Z. Mazzotta, D. Comparat, T. Wolz and C. Malbrunot,
Induced THz transitions in Rydberg caesium atoms for application in antihydrogen experiments
, Eur. Phys. J. D
75
, 1: 27: 1-8 (2021)
Logo
Close
Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter