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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef:
Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy
In:
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte,
Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics
, Appl. Phys. B- Lasers O
129
, 91: 1-11 (2023)
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte,
PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography
, Opt. Express
31
, (9), 13763-13797 (2023)
S.D.C. Roscam Abbing,
Control over extreme-ultraviolet high-harmonic generation from gases and solids
, VU University Amsterdam, 2023-03-27
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte,
High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams
, Optica
10
, (2), 255-263 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef,
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology
, Opt. Express
31
, (1), 411-425 (2023)
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte,
Nanosecond laser ablation threshold of liquid tin microdroplets
, Appl. Phys. A
128
, (7), 570: 1-8 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
, J. Opt.
24
, (5), 054014: 1-13 (2022)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter