Publications - EUV Generation & Imaging - ARCNL

T. van Gardingen-Cromwijk, S.G.J. Mathijssen, M. Noordam, S. Witte, J.F. de Boer and A.J. den Boef, Enhancing diffraction-based overlay metrology capabilities in digital holographic microscopy using model-based signal separation, J. Micro/Nanopattern. Mater. Metrol. 23, (4), 044006: 1-14 (2024)
K. Murzyn, M.L.S. van der Geest, L. Guery, Z. Nie, P. van Essen, S. Witte and P.M. Kraus, Breaking Abbe’s diffraction limit with harmonic deactivation microscopy, Sci. Adv. 10, (46), eadp3056: 1-8 (2024)
A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte, Illumination diversity in multiwavelength extreme ultraviolet ptychography, Photon. Res. 12, (12), 2757-2771 (2024)
F. Zhang, A. Pelekanidis, A. Karpavicius, M. Gouder, J. Seifert, K.S.E. Eikema and S. Witte, Characterizing post-compression of mJ-level ultrafast pulses via loose focusing in a gas cell, Opt. Express 32, (23), 40990-40990 (2024)
J.H. Buss, S. Starosielec, M. Schulz, R. Riedel, F. Campi, C.S. Lehmann, S. Witte and P.M. Kraus, Mid-infrared optical parametric chirped-pulse amplifier at 50 W and 38 fs pumped by a high-power Yb-InnoSlab platform, Opt. Express 32, (21), 36185-36192 (2024)
X. Liu, Spectrally resolved Extreme Ultraviolet Lensless Imaging With High-Order Harmonic Generation Sources, VU University Amsterdam, 2024-09-16
J. Mathijssen, E.J. Salumbides, K.S.E. Eikema and S. Witte, Sub-cycle dynamics in two-color high-harmonic generation from laser-produced plasmas, Opt. Express 32, (17), 30824-30838 (2024)
H.C. Strauch, F. Zhang, S. Mathias, T. Hohage, S. Witte and G.S.M. Jansen, Fast spectroscopic imaging using extreme ultraviolet interferometry, Opt. Express 32, (16), 28644-26654 (2024)
M. Illienko, M.C. Velsink and S. Witte, Understanding photoacoustic signal formation in the presence of transparent thin films, Photoacoustics 38, 100617: 1-8 (2024)
T. van Gardingen-Cromwijk, S. Konijnenberg, W. Coene, M. Adhikary, T. Tukker, S. Witte, J.F. de Boer and A.J. den Boef, Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology, Light adv. manuf. 4, (4), 453-465 (2023)

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