Publications - EUV Generation & Imaging - ARCNL

M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte, Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics, Appl. Phys. B- Lasers O 129, 91: 1-11 (2023)
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte, PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography, Opt. Express 31, (9), 13763-13797 (2023)
S.D.C. Roscam Abbing, Control over extreme-ultraviolet high-harmonic generation from gases and solids, VU University Amsterdam, 2023-03-27
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte, High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams, Optica 10, (2), 255-263 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)
C. Messinis, Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology, VU University Amsterdam, 2022-11-29
R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte, Nanosecond laser ablation threshold of liquid tin microdroplets, Appl. Phys. A 128, (7), 570: 1-8 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef, Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects, Opt. Continuum 1, (5), 1202-1217 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra, Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review), J. Opt. 24, (5), 054014: 1-13 (2022)

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