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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
A. Pelekanidis,
Multi-wavelength extreme ultraviolet ptychography for imaging and wavefront sensing
, VU University Amsterdam, 2025-09-17
T.C. Cromwijk,
Advancing overlay metrology using digital holographic microscopy
, VU University Amsterdam, 2025-07-03
M.C. Velsink, M. Illienko, K. Chaudhary and S. Witte,
Improving signal-to-noise ratios in pump-probe spectroscopy on light-sensitive samples by adapting pulse repetition rates
, Opt. Express
33
, (11), 23632-23632 (2025)
M. Illienko, K. Chaudhary, M.C. Velsink and S. Witte,
Characterization of Sub-Optical-Wavelength Structures through Optically Opaque Films Using Picosecond Ultrasonics
, Nano Lett.
25
, (22), 8909-8914 (2025)
Y. van der Werf, K. Steinebach, R. Jannin, H.L. Bethlem and K.S.E. Eikema,
Alpha and helion particle charge radius difference determined from quantum-degenerate helium
, Science
388
, (6749), 850-853 (2025)
E.J. Salumbides, Y. Ezzo, Z. Mazzotta, W.M.G. Ubachs, K.S.E. Eikema, O.O. Versolato and S. Witte,
Arbitrary pulse shaping in a mid-infrared optical parametric oscillator source
, Opt. Express
33
, (10), 20656-20663 (2025)
A. Pelekanidis, K.S.E. Eikema and S. Witte,
Far-field optical propagators with user-defined object-plane pixel size for ptychography
, Opt. Continuum
4
, (4), 804-825 (2025)
J. Mathijssen,
High-order harmonic generation in laser-produced plasmas
, VU University Amsterdam, 2025-03-25
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
K. Chaudhary, M. Illienko, T.J. van den Hooven, S. Witte and P.C.M. Planken,
Optically enhancing and controlling photoacoustic signals using ultra-thin semiconductor coatings on metal surfaces
, Opt. Express
33
, (1), 199-214 (2025)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact
ARCNL Newsletter