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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Generation & Imaging
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte,
Nanosecond laser ablation threshold of liquid tin microdroplets
, Appl. Phys. A
128
, (7), 570: 1-8 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
, J.Opt.
5
, 054014: 1-13 (2022)
A.C.C. de Beurs, L. Lötgering, M. Herczog, M. Du, K.S.E. Eikema and S. Witte,
aPIE: an angle calibration algorithm for reflection ptychography
, Opt. Lett.
47
, (8), 1949-1952 (2022)
A. Antoncecchi,
Laser-ultrasonics and imaging through metal layers
, VU University Amsterdam, 2022-03-30
R.A. Meijer, D. Kurilovich, K.S.E. Eikema, O.O. Versolato and S. Witte,
The transition from short- to long-timescale pre-pulses: Laser-pulse impact on tin microdroplets
, J. Appl. Phys
131
, (10), 105905: 1-11 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor
, J. Micro/Nanopattern. Mats. Metro
21
, (1), 014001: 1-10 (2022)
L. Lötgering, S. Witte and J. Rothhardt,
Advances in laboratory-scale ptychography using high harmonic sources [Invited]
, Opt. Express
30
, (3), 4133-4164 (2022)
H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte,
Enhancing the detection of laser-excited strain waves via transparent nanolayers
, Phys.Rev.B
104
, (20), 205416: 1-8 (2021)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
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