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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Ion Interactions
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra,
Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions
, Phys. Rev. Lett.
134
, (9), 093002: 1-6 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam,
Plasma sources for advanced semiconductor applications
, Appl. Phys. Lett.
125
, (23), 230401: 1-9 (2024)
J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato,
Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas
, Phys. Rev. Lett.
133
, (12), 125101: 1-6 (2024)
L. Assink, J. Brötzner, C. Cupak, M. Salverda, H.T. Jonkman, O.O. Versolato, R.A. Wilhelm and R. Hoekstra,
On the question whether surface roughness can explain the absence of a prominent single-collision peak in keV heavy-ion scattering off a polycrystalline Ru surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
554
, 165442: 1-6 (2024)
K. Bijlsma,
Electron capture in collisions of tin ions with molecular hydrogen
, University of Groningen, 2024-06-18
G. D’Auria, R. Hoekstra, T.G. Lucas and et. al,
The CompactLight Design Study
, Eur. Phys. J. Spec. Top.
233
, 1-208 (2024)
K. Bijlsma, L. Oltra, E. de Wit, L. Assink, I. Rabadán, L. Méndez and R. Hoekstra,
Electron Capture from Molecular Hydrogen by Metastable Sn2+* Ions
, Atoms
12
, (2), 9: 1-12 (2024)
J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, I. Bespalov, R. Lindblad, M. Timm, C. Bülow, V. Zamudio-Bayer, J.T. Lau, B. von Issendorff, R. Hoekstra, K. Witte, B. Watts, T. Schlathölter and A.M. Brouwer,
Soft X-ray absorption and fragmentation of tin-oxo cage photoresists
, Phys. Chem. Chem. Phys.
26
, (7), 5986-5998 (2024)
R.A. Wilhelm, M.J. Deuzeman, S. Rai, W. Husinsky, P.S. Szabo, H. Biber, R. Stadlmayr, C. Cupak, J. Hundsbichler, C. Lemell, M. Möller, A. Mutzke, G. Hobler, O.O. Versolato, F. Aumayr and R. Hoekstra,
On the missing single collision peak in low energy heavy ion scattering
, Nucl. Instrum. Methods. Phys. Res., Sect B
544
, 165123: 1-12 (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter