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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Ion Interactions
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan,
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
, Nature Commun.
11
, (1), 2334: 1-8 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Spectral characterization of an industrial EUV light source for nanolithography
, J. Phys. D: Appl. Phys.
53
, (5), 055204: 1-7 (2020)
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato:
Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.
F. Torretti,
Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography
, VU University Amsterdam, 2019-12-19
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma
, Appl. Phys. Lett.
115
, (12), 124101: 1-6 (2019)
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan,
Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions
, J. Phys. B: At. Mol. Opt. Phys.
52
, (17), 171002: 1-49 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma
, Phys. Rev. Appl.
12
, (1), 014010: 1-11 (2019)
M.J. Deuzeman,
Generation and interactions of energetic tin ions
, University of Groningen, 2019-06-21
D. Kurilovich,
Laser-induced dynamics of liquid tin microdroplets
, VU University Amsterdam, 2019-04-04
D. Bodewits and R. Hoekstra,
Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules
, Atoms
7
, (1), 17: 1-11 (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
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