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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Ion Interactions
Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato,
The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
, AIP Advances
11
, (12), 125003: 1-9 (2021)
D.J. Hemminga, L. Poirier, M.M. Basko, R. Hoekstra, W.M.G. Ubachs, O.O. Versolato and J. Sheil,
High-energy ions from Nd:YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model
, Plasma Sources Sci. Technol.
30
, (10), 105006: 1-10 (2021)
R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
, J. Phys. D: Appl. Phys.
54
, (36), 365103: 1-12 (2021)
R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of 1- and 2−μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
, Phys. Rev. Res.
3
, (1), 013294: 1-9 (2021)
R. Schupp,
Spectral characterization of solid-state laser-driven plasma sources of EUV light
, Vrije Universiteit Amsterdam, VU, 2021-03-17
L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Extreme ultraviolet light from a tin plasma driven by a 2-μm-wavelength laser
, Opt. Express
29
, (3), 4475-4487 (2021)
J. Scheers,
Charge-state-resolved spectroscopy of multiply-charged tin ions
, Vrije Universiteit Amsterdam, VU, 2020-11-10
S. Rai, K. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra,
Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
482
, 58-63 (2020)
Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas
, J. Phys. B: At. Mol. Opt. Phys.
53
, (19), 195001: 1-11 (2020)
J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma
, Phys. Rev. E
102
, (1), 013204: 1-9 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
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ARCNL Newsletter