Publications - EUV Photoresists - ARCNL

O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Technol. 33, (2), 229-234 (2020)
O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, (8), 5302-5309 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega, Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, (8), 9881-0889 (2020)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, (4), 043504: 1-11 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, (38), 4136-4141 (2019)
Y. Zhang, Organotin Photoresists for extreme ultraviolet lithography, University of Amsterdam, UvA, 2019-04-11
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: Zinc-based metal oxoclusters: towards enhanced EUV absorptivity In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: The role of the organic shell in hybrid molecular materials for EUV lithography In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.
L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega, Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists, J. of Micro/Nanolithography. MEMS and MOEMS 18, (1) (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega, Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications, J. Mater. Chem. C 7, (1), 33-37 (2019)

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