Publications - EUV Photoresists - ARCNL

M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)
C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, UvA, 2021-06-30
O.C.M. Lugier, Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography, University of Amsterdam, UvA, 2021-06-03
Y. Zhang, J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer, Extreme ultraviolet photoemission of a tin-based photoresist, Appl. Phys. Lett. 118, (17), 171903: 1-6 (2021)
T. Suhina, D. Bonn, B. Weber and A.M. Brouwer, Photophysics of Fluorescent Contact Sensors Based on the Dicyanodihydrofuran Motif, ChemPhysChem 22, (2), 221-227 (2021)
L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, UvA, 2020-11-18
L. Wu, I. Bespalov, K. Witte, O.C.M. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos Ortega, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J. Mater. Chem. C 8, (42), 14757-14765 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J. Mater. Chem. C 8, (41), 14499-14506 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Technol. 33, (2), 153-158 (2020)
N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, (2), 145-151 (2020)

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