Publications - EUV Photoresists - ARCNL

J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, I. Bespalov, R. Lindblad, M. Timm, C. Bülow, V. Zamudio-Bayer, J.T. Lau, B. von Issendorff, R. Hoekstra, K. Witte, B. Watts, T. Schlathölter and A.M. Brouwer, Soft X-ray absorption and fragmentation of tin-oxo cage photoresists, Phys. Chem. Chem. Phys. 26, (7), 5986-5998 (2024)
N. Sadegh, Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists, University of Amsterdam, UvA, 2023-09-20
C.-C. Hsu, F.-C. Hsia, B. Weber, M.B. de Rooij, D. Bonn and A.M. Brouwer, Local Shearing Force Measurement during Frictional Sliding Using Fluorogenic Mechanophores, J. Phys. Chem. Lett. 13, (38), 8840-8844 (2022)
N. Thakur, Zinc Oxoclusters for Extreme Ultraviolet Lithography, University of Amsterdam, UvA, 2022-03-28
N. Thakur, M. Vockenhuber, Y. Ekinci, B. Watts, A. Giglia, N. Mahne, S. Nannarone, S. Castellanos Ortega and A.M. Brouwer, Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance, ACS Mater. Au 2, (3), 343-355 (2022)
C.D. Dieleman, J.S. van den Burgt, N. Thakur, E.C. Garnett and B. Ehrler, Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography, ACS Appl. Energy Mater. 5, (2), 1672-1680 (2022)
M.L.S. van der Geest, N. Sadegh, T.M. Meerwijk, E.I. Wooning, L. Wu, E. Bloem, S. Castellanos Ortega, A.M. Brouwer and P.M. Kraus, Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source, Rev. Sci. Instrum. 92, (11), 113004: 1-9 (2021)
L. Wu, M.F. Hilbers, O.C.M. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega, Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography, ACS Appl. Mater. Interfaces 13, (43), 51790-51798 (2021)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)
O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)

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