Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists

Publication date
DOI http://dx.doi.org/10.1117/1.JMM.18.1.013504
Reference L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos, Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists, J. Micro/Nanolith. MEMS and MOEMS 18, 1 (2019)
Group EUV Photoresists