Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists Publication date 27 February 2019 DOI http://dx.doi.org/10.1117/1.JMM.18.1.013504 Reference L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega, Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists, J. of Micro/Nanolithography. MEMS and MOEMS 18, (1) (2019) Download (pre)print Request this article
