Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

Publication date
DOI http://dx.doi.org/10.1039/C8TC05273E
Reference L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos, Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications, J.Mater.Chem.C 7, 1: 33-37 (2019)
Group EUV Photoresists