Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications Publication date 7 January 2019 DOI http://dx.doi.org/10.1039/C8TC05273E Reference L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega, Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications, J. Mater. Chem. C 7, (1), 33-37 (2019) Download (pre)print Request this article
