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Group leader in the Plasma Theory and Modeling group Shining a Light on Next-Generation Microchips Over three thousand years ago, the Celts mined tin to make bronze for their tools and weaponry. Nowadays, tin is …
On Thursday, December 19th Francesco Torretti (from the ARCNL group EUV Plasma Processes) defended his PhD thesis ‘Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography’ at the Vrije Universiteit in Amsterdam. Torretti obtained his …
O.O. Versolato, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra, Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review), J. Opt. 24, (5), 054014: 1-13 (2022)
On April 4th, Dmitry Kurilovich defended his PhD thesis ‘Laser-induced dynamics of liquid tin microdroplets’. Kurilovich is the first PhD student to start and finish his doctoral studies at ARCNL. The graduation marks, therefore, a …
Ronnie Hoekstra (ARCNL group leader) received EU funding for his work on the dynamics of the electron beam driving an X-ray light source. The grant was awarded to the consortium CompactLight of which VU and …
ARCNL group leader and VU Assistant Professor John Sheil receives a Veni grant from NWO for his project “ARIES”. Sheil will develop a unique laser-plasma simulation capability to guide the design of tomorrow’s more powerful …
In the annual article writing competition of the Dutch Journal of Physics (NTvN) former PhD student Matthijs Jansen got second place with his article ‘The color of X-ray radiation’. Jansen describes the development of a …
Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer, Dual-tone Application of a Tin-Oxo Cage Photoresist
Under E-beam and EUV Exposure, J. Photopolymer. Sci.Tec. 31, (2), 249-255 (2018)