Group leaders: Dr. Angana Mondal
Short-Wavelength Light Sources for EUV Metrology
We develop new types of compact light sources that emit extreme-ultraviolet (EUV) to soft-X-ray radiation, using advanced materials and tailored laser-matter interactions. Our goal is to create bright, stable and precisely tunable beams that can support the metrology needs of next-generation semiconductor manufacturing. By improving how these short wavelengths are generated and controlled, we enable non-invasive, high-resolution measurements of ever-smaller features in computer chips and related nanostructures.
Why short wavelengths?
The wavelength of light determines the color of the light, but it also determines the lower limit of what can be seen using the light. As computer chip features continue to shrink according to Moore’s law, the resolution for measuring surface features and alignment during the manufacturing process needs to increase as well. Using light sources with very short wavelengths can contribute to higher resolution imaging. Our group focuses on generating light with wavelengths ranging from a few nanometers up to 100-200 nanometers, in the soft X-ray and extreme ultraviolet (EUV) ranges.
Novel materials
Our light sources will use laser interactions with novel materials such as liquids, layered solids, and two-dimensional heterostructures. The structure of material interfaces and electrical properties will allow tuning of the light that is emitted. For example, alternating layers of two different materials will interact differently with laser light than just one of those materials, due to both different internal structures and the interfaces between layers. This way, we gain access to a wider range of light emission sources.
