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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Master Thesis

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Books
  • Master Thesis
  • Proceedings
  • Theses
  • J. Lopez Leyva, Light Induced Damage of Silicon Nitride with femtosecond laser, Eindhoven University of Technology, 2023-09-01

  • M. Bijker, RALEF-2D for Modeling Laser-Produced Plasma: Investigating Anisotropy in Plasma Expansion for Varying Laser Intensities, Vrije Universiteit Amsterdam, VU, 2023-07-17

  • , Recombination in an expanding laser-produced tin plasma for EUV lithography, Eindhoven University of Technology, 2023-01-16

  • E. Perez Penco, Effect of atomic and molecular hydrogen on the reduction process of ruthenium dioxide, University of Amsterdam, UvA, 2022-07-27

  • D.J. Engels, Investigating the Composition of Tin Vapor, Eindhoven University of Technology, 2022-06-12

  • A. Sutton-Cook, Chemical Mechanical Polishing of the Apex of Microcrystalline Diamond Coated Hemispheres, University of East Anglia, 2021-10-05

  • R. Hahury, An Investigation of Repulsive Capillary Forces, De Haagse Hogeschool, 2021-09-29

  • T.N. Hogenelst, Pulsed laser deposition synthesis of high entropy carbide (HfNbTaTiZr)C thin films with near-equiatomic composition, University of Amsterdam, UvA, 2021-08-04

  • E. Sauzeau, Characterization of topography across the scales, Université de Limoges, 2021-06-14

  • M. Morbey, Numerical Simulations of Droplet Impact by a Laser Pulse, Eindhoven University of Technology, 2021-03-08

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter