Nanoscale Imaging and Metrology group focuses on the advanced imaging, sensing and metrology tools. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques with a spatial resolution beyond the Abbe (diffraction) limit and temporal resolution beyond the Nyquist limit. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography. The group’s research connects several modern and dynamic scientific fields: computational imaging, complex wavefront shaping, compressive sensing, endo-microscopy and optical metrology.