Nanoscale Imaging and Metrology group focuses on the advanced imaging, sensing and metrology tools. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques with a spatial resolution beyond the Abbe (diffraction) limit and temporal resolution beyond the Nyquist limit. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography. The group’s research connects several modern and dynamic scientific fields: computational imaging, complex wavefront shaping, compressive sensing, endo-microscopy and optical metrology.
As of October 1, Lyuba Amitonova has been appointed as a tenure-track group leader at ARCNL. Earlier this year, she has been awarded a WISE grant from NWO supporting her …
NWO has awarded three talented female scientists a WISE grant. Dr. Liubov Amitonova has received an appointment at the Advanced Research Centre for Nanolithography (ARCNL), Dr. Julia Engelmann at the …
