Publications - ARCNL

R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A. den Boef, J.T.B. Overvelde and A.F. Koenderink, Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets, ACS Photonics, (2020)
C. Messinis, V.T. Tenner, J.F. Boer, S. Witte and A. den Boef, Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons, Appl.Opt. 59, 11: 3498-3507 (2020)

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