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EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Computational Imaging
Group leader: Prof. dr. Arie den Boef
Computational Imaging
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Latest Publications
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T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef,
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology
, Opt. Express
31
, (1), 411-425 (2023)
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor
, J. Micro/Nanopattern. Mats. Metro
21
, (1), 014001: 1-10 (2022)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef,
Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology
, Opt. Express
29
, (23), 38237-38256 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef:
Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy
In:
Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE., 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, (25), 37419-37435 (2020)
R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A.J. den Boef, J.T.B. Overvelde and A.F. Koenderink,
Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets
, ACS Photonics
7
, (10), 2765-2777 (2020)
C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef:
Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
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Coming from abroad
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