Logo
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter
Directory
menu
Search
Publications - Computational Imaging
F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink,
Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface
, Nano Lett.
24
, (41), 12942-12947 (2024)
T. van Gardingen-Cromwijk, S. Konijnenberg, W. Coene, M. Adhikary, T. Tukker, S. Witte, J.F. de Boer and A.J. den Boef,
Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology
, Light adv. manuf.
4
, (4), 453-465 (2023)
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef:
Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy
In:
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6
M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef,
Illumination spot profile correction in digital holographic microscopy for overlay metrology
, J. Micro/Nanopattern. Mats. Metro
22
, (2), 024001: 1-14 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W. Coene, S. Witte, J.F. de Boer and A.J. den Boef,
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology
, Opt. Express
31
, (1), 411-425 (2023)
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor
, J. Micro/Nanopattern. Mats. Metro
21
, (1), 014001: 1-10 (2022)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef,
Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology
, Opt. Express
29
, (23), 38237-38256 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
Logo
Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter