Publications - Computational Imaging - ARCNL

C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef, Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology, Opt. Express 29, (23), 38237-38256 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef: Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy In: Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms, Opt. Express 28, (25), 37419-37435 (2020)
R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A.J. den Boef, J.T.B. Overvelde and A.F. Koenderink, Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets, ACS Photonics 7, (10), 2765-2777 (2020)
C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef: Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.
C. Messinis, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef, Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons, Appl. Opt. 59, (11), 3498-3507 (2020)

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