Publications - Computational Imaging - ARCNL

Z. Lyu, High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing, VU University Amsterdam, 2024-12-11
N. Feldman, K.M.M. Goeloe, A.J. den Boef, L.V. Amitonova and A.F. Koenderink, Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces, ACS Photonics, (2024)
F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface, Nano Lett. 24, (41), 12942-12947 (2024)
T. van Gardingen-Cromwijk, S. Konijnenberg, W. Coene, M. Adhikary, T. Tukker, S. Witte, J.F. de Boer and A.J. den Boef, Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology, Light adv. manuf. 4, (4), 453-465 (2023)
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6
M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef, Illumination spot profile correction in digital holographic microscopy for overlay metrology, J. Micro/Nanopattern. Mats. Metro 22, (2), 024001: 1-14 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)
C. Messinis, Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology, VU University Amsterdam, 2022-11-29
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef, Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects, Opt. Continuum 1, (5), 1202-1217 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor, J. Micro/Nanopattern. Mats. Metro 21, (1), 014001: 1-10 (2022)

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2024