Advanced Research Center for Nanolithography

‘Cutting-edge research in physics and materials science to advance nanolithography, strengthening the research system in nanolithography technology, and accelerating the transition from fundamental discovery to implementation in the semiconductor industry.’

Latest news

  • Shrinking the spotlight: super-resolution microscopy without labels

    ARCNL researchers in the group of Peter Kraus have demonstrated a way to overcome the diffraction limit in optical microscopy, using laser techniques that shape…

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  • ARCNL research well represented at NWO Physics 2026 in Veldhoven

    ARCNL had a strong and visible presence at NWO Physics, held on 20-21 January 2026 in Veldhoven. The annual conference brought together the Dutch physics…

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  • New measurement technology to further sensing capabilities

    The research teams of Lyuba Amitonova (ARCNL) and Femius Koenderink (AMOLF) investigated new optical detection strategies to efficiently measure perturbations at the nanometer scale. For…

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  • Harnessing water’s stickiness for adhesion control 

    Printing computer chips with nanoscale features requires extremely precise positioning. Electric charges and water on surfaces can impact this precision, but these effects have not been fully understood. Now, ARCNL postdoctoral…

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Upcoming events

    • April 1 - 2, 2026
    • Symposium

    NNV Plasma Physics symposium

    The 2nd “Plasma Zonheuvel” conference, short for “NNV Plasma Physics Symposium Zonheuvel”, is part of the renewed conference…

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Interview

One year into partnership University of Groningen

How is it going and what to expect?

The University of Groningen joined the ARCNL public-private partnership as associate partner on January 1st, 2022. ARCNL group leader Ronnie Hoekstra and governing board member Caspar van der Wal reflect on the route towards this newly established partnership and on the challenges and advantages it offers.

Read more about the partnership between ARCNL and the University of Groningen (RUG)