Publications - Plasma Theory and Modeling - ARCNL

S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil, Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography, Plasma Sources Sci. Technol. 33, (10), 105003: 1-14 (2024)
J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato, Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas, Phys. Rev. Lett. 133, (12), 125101: 1-6 (2024)
J. Gonzales Muñoz and J. Sheil, On the role of target mass in extreme ultraviolet light generation from CO2-driven tin plasmas for nanolithography, Phys. Plasmas 31, (5), 050701: 1-7 (2024)
S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox, Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources, Appl. Phys. Lett. 124, (17), 174101: 1-8 (2024)
K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil, Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations, Appl. Phys. Lett. 124, (10), 102104 : 1-7 (2024)
Y. Mostafa, L. Behnke, D.J. Engels, Z. Bouza, J. Sheil, W.M.G. Ubachs and O.O. Versolato, Production of 13.5 nm light with 5% conversion efficiency from 2 μm laser-driven tin microdroplet plasma, Appl. Phys. Lett. 123, (23), 234101: 1-7 (2023)
D.J. Hemminga, Single-fluid radiation-hydrodynamic modeling of laser-driven EUV-emitting plasmas, VU University Amsterdam, 2023-11-20
J. Sheil, O.O. Versolato, V. Bakshi and H. Scott, Review of the 1st EUV Light Sources Code Comparison Workshop, Atoms 11, (10), 130: 1-18 (2023)
J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148
L. Poirier, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)

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