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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials & Surface Science for EUVL
Roland Bliem
Nanophotochemistry
Fred Brouwer
Materials Theory and Modeling
Emilia Olsson
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Publications - EUV Photoresists
N. Thakur,
Zinc Oxoclusters for Extreme Ultraviolet Lithography
, University of Amsterdam, 2022-03-28
N. Thakur, M. Vockenhuber, Y. Ekinci, B. Watts, A. Giglia, N. Mahne, S. Nannarone, S. Castellanos Ortega and A.M. Brouwer,
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
, ACS Mater. Au, (2022)
C.D. Dieleman, J.S. van den Burgt, N. Thakur, E.C. Garnett and B. Ehrler,
Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography
, ACS Appl. Energy Mater., (2022)
M.L.S. van der Geest, N. Sadegh, T.M. Meerwijk, E.I. Wooning, L. Wu, R. Bloem, S. Castellanos Ortega, A.M. Brouwer and P.M. Kraus,
Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source
, Rev. Sci. Instrum.
92
, (11), 113004: 1-9 (2021)
L. Wu, M.F. Hilbers, O. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega,
Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography
, ACS Appl. Mater. Interfaces
13
, (43), 51790-51798 (2021)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer,
UV and VUV-induced fragmentation of tin-oxo cage ions
, Phys. Chem. Chem. Phys.
23
, (37), 20909-20918 (2021)
O. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers
, ACS Appl. Mater. Interfaces
13
, (36), 43777-43786 (2021)
M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek,
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
, Phys. Chem. Chem. Phys.
23
, (31), 16646-16657 (2021)
C.D. Dieleman,
Patterning Colloidal Nanocrystals with Light and Electrons
, University of Amsterdam, 2021-06-30
O. Lugier,
Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography
, University of Amsterdam, 2021-06-03
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials & Surface Science for EUVL
Roland Bliem
Nanophotochemistry
Fred Brouwer
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter