March 25, 2018
S. Castellanos Ortega, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung: Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists In: Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)