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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
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      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Nanolayers ad interim
      • Contact Dynamics Bart Weber Steve Franklin
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Scientific Internship: Nanoscale deformations of macroscale interfaces

    April 29, 2022 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Scientific Internship: Dynamics of capillary condensation and adhesion

    April 19, 2022 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Scientific Internship: Atomic scale wear at macroscopically loaded interfaces

    April 19, 2022 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Scientific Internship: Shaping laser-induced tin targets for EUV generation

    February 1, 2022 · Scientific internships

    In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …

  • Scientific Internship: Radiation-hydrodynamics simulations of tin explosions

    February 1, 2022 · Scientific internships

    In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …

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© ARCNL 2022

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers ad interim
      • Contact Dynamics Bart Weber Steve Franklin
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter