This PhD projects aims at predictive modelling of laser-produced tin plasma sources of extreme ultraviolet (EUV) radiation for nanolithography. You will complement current experimental activities with analytical and numerical theoretical …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography. We contribute to the …
Thin films play a crucial role in nanolithography technology, since they are the basic elements of multilayer reflector components, protective coatings, and envisaged ultrathin free-standing membranes protecting highly sensitive nanostructures, …
