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Lars Behnke wins second prize at SPIE conference

Published on November 2, 2022
Category EUV Plasma Processes

PhD student Lars Behnke (EUV Plasma Processes) has won the second prize with his talk Two-micrometer-wavelength laser-produced tin plasma EUV sources at the International Conference on Extreme Ultraviolet Lithography 2022 (SPIE).

The award is named EUV Tech Award for Emerging Talent in the Industry.

 

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